Prof. Dr. Joachim Wollschläger

Office address

Universität Osnabrück

Fachbereich Physik

Barbarastr. 7, 49069 Osnabrück

Phone +49 (0)541 969 2651

Fax +49 (0)541 969 3510

Atomic structure and electronic properties of silicide nanowires

• structure and (growth) morphology of ultrathin films (mostly dielectric films)

• surface and thin film diffraction (electrons, x-rays)

• magnetic properties of ultrathin films

1. T. Kuschel, H. Bardenhagen, H. Wilkens, R. Schubert, J. Hamrle, J. Pistora and J. Wollschläger,

Vectorial magnetometry using magnetooptic Kerr effect including first and second order contributions for thin ferromagnetic films

J. Phys. D: Appl. Phys. 44, 265003 (2011).

2. S. Gevers, J.I. Flege, B. Kaemena, D. Bruns, T. Weisemoeller, J. Falta, and J. Wollschläger,

Improved Epitaxy of Ultrathin Praseodymia Films on Chlorine Passivated Si(111) Reducing Silicate Interface Formation

Appl. Phys. Lett. 97, 242901(2010).

3. C. Deiter, M. Bierkandt, A. Klust, C. Kumpf, Yixi Su, O. Bunk, R. Feidenhans’l and J. Wollschläger,

Structural Transitions and Relaxation Processes during Epitaxial Growth of Ultrathin CaF2 Films on Si(111)

Phys. Rev. B 82, 085449 (2010).

4. T. Weisemoeller, C. Deiter, F. Bertram, S. Gevers, A. Giussani, P. Zaumseil, T. Schroeder, and J. Wollschläger,

Epitaxy of Single Crystalline PrO2 Films on Si(111)

Appl. Phys. Lett. 93, 032905 (2008).

5. J. Wollschläger and C. Tegenkamp,

Diffraction from Disordered Vicinal Surface with Alternating Terraces

Phys. Rev. B 75, 245439 (2007).