Prof. Dr. Joachim Wollschläger

Office address
Universität Osnabrück
Fachbereich Physik
Barbarastr. 7, 49069 Osnabrück
Phone +49 (0)541 969 2651
Fax +49 (0)541 969 3510
Email: joachim.wollschlaeger(at)uos.de
Web: wollschlaeger.physik.uni-osnabrueck.de/
Project E2
Atomic structure and electronic properties of silicide nanowires
Areas of Research
• structure and (growth) morphology of ultrathin films (mostly dielectric films)
• surface and thin film diffraction (electrons, x-rays)
• magnetic properties of ultrathin films
Selected Publications
1. T. Kuschel, H. Bardenhagen, H. Wilkens, R. Schubert, J. Hamrle, J. Pistora and J. Wollschläger,
Vectorial magnetometry using magnetooptic Kerr effect including first and second order contributions for thin ferromagnetic films
J. Phys. D: Appl. Phys. 44, 265003 (2011).
2. S. Gevers, J.I. Flege, B. Kaemena, D. Bruns, T. Weisemoeller, J. Falta, and J. Wollschläger,
Improved Epitaxy of Ultrathin Praseodymia Films on Chlorine Passivated Si(111) Reducing Silicate Interface Formation
Appl. Phys. Lett. 97, 242901(2010).
3. C. Deiter, M. Bierkandt, A. Klust, C. Kumpf, Yixi Su, O. Bunk, R. Feidenhans’l and J. Wollschläger,
Structural Transitions and Relaxation Processes during Epitaxial Growth of Ultrathin CaF2 Films on Si(111)
Phys. Rev. B 82, 085449 (2010).
4. T. Weisemoeller, C. Deiter, F. Bertram, S. Gevers, A. Giussani, P. Zaumseil, T. Schroeder, and J. Wollschläger,
Epitaxy of Single Crystalline PrO2 Films on Si(111)
Appl. Phys. Lett. 93, 032905 (2008).
5. J. Wollschläger and C. Tegenkamp,
Diffraction from Disordered Vicinal Surface with Alternating Terraces
Phys. Rev. B 75, 245439 (2007).